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We demonstrate a-axis YBa2Cu3O7−x/PrBa2Cu3O7−x/YBa2Cu3O7−x trilayers grown on (100) LaAlO3 substrates with improved interface smoothness. The trilayers are synthesized by ozone-assisted molecular-beam epitaxy. The thickness of the PrBa2Cu3O7−x layer is held constant at 8 nm, and the thickness of the YBa2Cu3O7−x layers is varied from 24 nm to 100 nm. X-ray diffraction measurements show all trilayers to have >97% a-axis content. The rms roughness of the thinnest trilayer is <0.7 nm, and this roughness increases with the thickness of the YBa2Cu3O7−x layers. The thickness of the YBa2Cu3O7−x layers also affects the transport properties: while all samples exhibit an onset of the superconducting transition at and above 85 K, the thinner samples show wider transition widths, ΔTc. High-resolution scanning transmission electron microscopy reveals coherent and chemically sharp interfaces and that growth begins with a cubic (Y,Ba)CuO3−x perovskite phase that transforms into a-axis oriented YBa2Cu3O7−x as the substrate temperature is ramped up. 

Abstract Transparent oxide thin film transistors (TFTs) are an important ingredient of transparent electronics. Their fabrication at the back‐end‐of‐line (BEOL) opens the door to novel strategies to more closely integrate logic with memory for data‐intensive computing architectures that overcome the scaling challenges of today's integrated circuits. A recently developed variant of molecular‐beam epitaxy (MBE) called suboxide MBE (S‐MBE) is demonstrated to be capable of growing epitaxial In₂O₃at BEOL temperatures with unmatched crystal quality. The fullwidth at halfmaximum of the rocking curve is 0.015° and, thus, ≈5x narrower than any reports at any temperature to date and limited by the substrate quality. The key to achieving these results is the provision of an In₂O beam by S‐MBE, which enables growth in adsorption control and is kinetically favorable. To benchmark this deposition method for TFTs, rudimentary devices were fabricated.